The content presents the fabrication and characterization of silicon-on-insulator (SOI)-based Schottky barrier field-effect transistors (SBFETs) with an integrated ferroelectric Hf0.5Zr0.5O2 (HZO) layer. The key innovation is the precise placement of the ferroelectric segment above the metal-semiconductor interfaces, allowing the ferroelectric polarization to modulate the Schottky barriers and control the carrier injection without altering the transport properties of the semiconductor channel.
The authors demonstrate that by applying positive or negative programming pulses to the dedicated polarity gates, the ferroelectric polarization can be tuned to switch the device behavior from predominantly p-type to n-type. Intermediate pulse voltages result in well-separated current levels, enabling the realization of multiple distinct states. The devices exhibit excellent stability, retaining the programmed state for at least 6 hours.
The results show that ferroelectric-enhanced SBFETs are promising building blocks for scaled, low-power hardware that can combine logic and memory functionalities, which is crucial for the development of next-generation artificial neural networks.
The key highlights and insights are:
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by Daniele Nazz... um arxiv.org 05-01-2024
https://arxiv.org/pdf/2404.19535.pdfTiefere Fragen