Core Concepts
Ferroelectric-enhanced Schottky barrier transistors can be used to realize versatile logic-in-memory hardware by enabling the tuning of carrier injection through the Schottky barriers without the need for external voltages.
Abstract
The content presents the fabrication and characterization of silicon-on-insulator (SOI)-based Schottky barrier field-effect transistors (SBFETs) with an integrated ferroelectric Hf0.5Zr0.5O2 (HZO) layer. The key innovation is the precise placement of the ferroelectric segment above the metal-semiconductor interfaces, allowing the ferroelectric polarization to modulate the Schottky barriers and control the carrier injection without altering the transport properties of the semiconductor channel.
The authors demonstrate that by applying positive or negative programming pulses to the dedicated polarity gates, the ferroelectric polarization can be tuned to switch the device behavior from predominantly p-type to n-type. Intermediate pulse voltages result in well-separated current levels, enabling the realization of multiple distinct states. The devices exhibit excellent stability, retaining the programmed state for at least 6 hours.
The results show that ferroelectric-enhanced SBFETs are promising building blocks for scaled, low-power hardware that can combine logic and memory functionalities, which is crucial for the development of next-generation artificial neural networks.
The key highlights and insights are:
Integration of a ferroelectric HZO layer precisely above the metal-semiconductor interfaces in SOI-based SBFETs.
Demonstration of tunable carrier injection by programming the ferroelectric polarization using positive or negative pulses applied to the polarity gates.
Ability to achieve multiple distinct current levels by varying the programming pulse height, enabling the realization of multiple states.
Excellent retention of the programmed states over time, showcasing the stability of the ferroelectric polarization.
Discussion of the limitations, such as the influence of charge trapping, and potential mitigation strategies.
Conclusion that ferroelectric-enhanced SBFETs are promising for the development of versatile, low-power logic-in-memory hardware for advanced artificial neural networks.
Stats
The maximum drain currents at the n-side (VBG=+20 V) and at the p-side (VBG=-20 V) show an exponential modulation as a function of the programming pulse height.
Quotes
"Ferroelectric-enhanced SBFETs are promising building blocks for scaled, low-power hardware that can combine logic and memory functionalities, which is crucial for the development of next-generation artificial neural networks."